전도성 고분자 막용 에칭액 및 이를 이용하여 전도성 고분자 막을 패터닝하는 방법

Etchant for conductive polymer membrane and method for patterning conductive polymer membrane using the same

Abstract

PURPOSE: An etchant for a conductive polymer membrane has excellent etching performance to a conductive polymer film and to be used in the etching process of an electrode film, an electromagnetic wave-shielding layer, and a conductive film for a touch panel. CONSTITUTION: An etchant for a conductive polymer membrane includes a chlorine compound and a solvent. The amount of the chlorine compound included is 0.5-50 wt% based on the total weight of the etchant. A method for patterning the conductive polymer membrane comprises a step of spreading a resist on the conductive polymer membrane or laminating a dry film resist on it; a step of selectively exposing the resist by using a mask; a step of removing the resist of a part changed by using a developer; a step of removing the conductivity of the polymer membrane exposed by using the etchant; and a step of removing a remaining resist membrane through a stripping process.
본 발명은 전도성 고분자 물질이 코팅된 막에 대하여 우수한 에칭 능력을 갖는 전도성 고분자 막용 에칭액 및 이를 이용하여 전도성 고분자 막을 패터닝하는 방법에 관한 것으로서, 본 발명에 따른 에칭액은 전극 필름, 전자파 차폐층, 및 터치패널용 전도성 필름 등의 에칭 공정에 유용하게 사용될 수 있다.

Claims

Description

Topics

Download Full PDF Version (Non-Commercial Use)

Patent Citations (0)

    Publication numberPublication dateAssigneeTitle

NO-Patent Citations (0)

    Title

Cited By (0)

    Publication numberPublication dateAssigneeTitle